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Built-in Visual Features Deliver Stunning Content

The visual features built into the processor deliver everything you need to enjoy a stunning and seamless experience when viewing content on your PC.

Two-Factor Authentication in Intel® IPT

Intel® Identity Protection Technology (Intel® IPT) prevents unauthorized access to your important accounts by improving your level of security.

Secure Transactions with Intel® IPT

Intel® Identity Protection Technology (Intel® IPT) prevents unauthorized access to your important accounts by improving your level of security.

Intel® Architecture Leads the Microarchitecture Innovation Field

Intel® architecture innovations are the foundation of Intel's business model and success.

The Basics of Intel® Architecture

White Paper: Describes the basic operation and function of platform ingredients used in three classes of Intel® architecture platforms. (Jan. 2009)

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Migration Solutions for Embedded Intel® Architecture

Klocwork* analyzes source code and inspects codebase before Intel® architecture migration, minimizing cost, effort, and complexity. (v.001, Oct. 2011)

Gate Dielectric Scaling for CMOS: from SiO2/PolySi to High-K/Metal-Gate

Presentation covers SiO2 scaling, high-k/metal-gate problems, breakthroughs, and performance reports for NMOS and PMOS transistors.

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Gate Dielectric Scaling for High-Performance CMOS: SiO2 to High-K

Gate Dielectric Scaling for High-Performance CMOS: SiO2 to High-K, an option for the 45nm high-performance logic technology node.

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Strained Germanium QWFE Transistor as P-Channel Device Option for Low Power III-V CMOS Architecture

Demonstrates a Germanium p-channel QWFET with thin scaled TOXE and high mobility, delivering four times higher hole mobility.

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Advanced Metal Gate/High-K Dielectric Stacks for CMOS Transistors

Paper: n-type and p-type metal electrodes on high-K gate dielectrics enable same oxide thickness, desirable transistor threshold, and more.

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